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トップページ > アーカイブス > No.3(2000)6.Effect of halogen ion implantation on friction behavior of titanium nitride films

No.3(2000)6.Effect of halogen ion implantation on friction behavior of titanium nitride films

印刷用ページを表示する 更新日:2016年12月19日更新

 

Atsushi MITSUO, Nobuhiro NIHIRA, Tatsuhiko AIZAWA

The effect of halogen ion implantation into titanium nitride films on the tribological properties against steels was investigated. TiN films were prepared on high speed tool steel substrates by means of ion plating with a thickness of approximately 2 μm. Ion implantation up to 1×1017 ions/cm2 was performed on the TiN surface at an energy of 50 and 100 keV for fluorine and chlorine ions, respectively. Friction and wear tests were carried out by a pin-on-disk tribometer with stainless steel balls as a counter material. No adhesion of the counter material was recognized in the wear tracks of F and Cl implanted TiN films. Further, the wear volume of the counter material was reduced by halogen ion implantation. Cl implantation significantly reduced the friction coefficient of TiN films. However, F implantation has nothing to do with the reduction of friction coefficient. Difference of F and Cl in tribological properties is thought to originate from the difference of chemical reaction with the counter material.

 

Keywords
Ion implantation, halogen ion, fluorine, chlorine, friction, titanium nitride film

 


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